Electronics Components

Partnership to deliver next-generation lithography process

Partnership to deliver next generation lithography process_popup

USHIO and the Netherlands Organisation for Applied Scientific Research (TNO) have recently worked on the joint venture project of developing an ultra violet EUV that will be part of next generation semiconductors products and making. According to Hiroshi Matsubura who is the president of Ushio Europe he said that this project will be beneficial in providing a technical expertise to the constraints of the semiconductor in near furture.
These firms TNO and USHIO are jointly working over this experimental UV product to create an ultra violte exposure element that wil be helping in facilitating the EU optics and the Reticles. This will be termed and coined as EBL2.  This will speed the development of next-generation lithography systems, masks, and pellicles.


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